Custom XPS
Custom XPS
Spectroscopy Systems
Some examples demonstrating the variety of our electron spectroscopy solutions.
Prof. Igor Shvets, Trinity College Dublin, Ireland / MULTIPROBE MXPS XP
The MXPS System is equipped with analysis and preparation chambers and a load-lock for fast sample introduction. An EA 125 U5 hemispherical analyzer with an XM 1000 monochromator and a CN 10 charge neutralizer for monochromatic XPS and an HIS 13 VUV source for UPS are mounted to the analysis chamber. The preparation chamber is equipped with a 4-grid SPECTALEED and ISE 5 sputtering source for sample preparation. Automated analysis is controlled by the CASCADE software.
Dr. Olivier Renault / MULTIPROBE MXPS RM
MULTIPROBE MXPS RM of Dr. Olivier Renault’s group at CEA-LETI Institute, MINATEC Nanocharacterization Centre in France. This dedicated XPS System is equipped with customized analysis and preparation chambers and a loadlock for fast sample introduction. It is designed to work either in a laboratory setting or at a synchrotron beam line. The analysis chamber is equipped with state-of-the-art analysis equipment to perform angle resolved XPS analysis. It includes a 5-axis liquid helium cooled high performance manipulator, a High Resolution Electron Analyser (EA125 U7 HR), a monochromated X-Ray source (XM 1000) as well as a dual-anode X-Ray source (DAR 400), source for charge neutralization (CN 10), depth profiling (FIG 05) & UPS (HIS 13), and a 4-grid LEED (SPEC 4).Prof. Weidong Wu / MULTIPROBE MXPS with PLD Preparation Chamber
MULTIPROBE MXPS with PLD Preparation Chamber for the group of Prof. Weidong Wu at Southwest China University of Science and Technology. The XPS System allows for in-situ examination of samples grown in the PLD preparation chamber. The analysis chamber is equipped with an AFM/STM and MATRIX Controller, a SPHERA U5 Electron Analyser, an XM 1000 X-Ray Monochromator, an EKF 300 electron gun for Auger Electron Spectroscopy, a FIG 05 ion source for depth profiling and an HIS 13 VUV source for UPS measurements. The CASCADE software allows automated experiments.The PLD chamber is equipped with a dedicated PLD sample manipulator which is able to run in an oxygen-rich environment at high temperatures. Besides the target stage with up to 5 targets for the laser ablation process a high pressure RHEED allows for in-situ characterization of the grown films. A load lock for fast sample and target introduction is attached to the PLD chamber.
Dr. Chris Nicklin / MULTIPROBE MXPS XP
MULTIPROBE MXPS XP for Dr. Chris Nicklin at the Diamond Light Source in the UK. This system consists of customized analysis and preparation chambers and a load lock for fast sample introduction. Sample analysis can be done with a LEED Spectrometer or a VT AFM XA together with Omicron’s MATRIX control unit.A SPHERA U7 electron analyzer is included for electron spectroscopy together with a monochromated X-Ray source (XM 1000) and a Dual Anode X-Ray Source (DAR 400). Auger Spectroscopy is done using the EKF 300 electron source and the HIS 13 VUV source is included for UPS measurements.
Prof. Suemitsu / MULTIPROBE MXPS System
MULTIPROBE MXPS System for the group of Prof. Suemitsu at Tohoku University in Japan. The XPS System is designed to accommodate 2 inch sized samples. It has customized analysis and preparation chambers and a load lock for fast sample introduction. Samples are pre-processed in the preparation chamber by a high temperature heating stage (> 1250°C) and immediately investigated by LEED (SPEC 4/254/45). Samples are analyzed in the analysis chamber on a high temperature 5-axis sample manipulator by XPS using an EA 125 U5 electron analyzer together with a DAR 400 Dual Anode X-Ray source. UPS is done using the HIS 13 VUV source. Structural analysis of the sample is performed in the Large Sample STM (LS STM) using the MATRIX control system. The system is prepared to accept a future upgrade to convert it into a high pressure XPS system.
MULTIPROBE MXPS System
MULTIPROBE MXPS System with three main chambers for electron spectroscopy, SPM and sample preparation. The electron spectroscopy chamber includes state of the art spectroscopy instrumentation including Argus hemispherical analyzer with an XM 1000 monochromator, a CN 10 charge neutralizer for monochromatic XPS and a FDG 150 sputter gun.
In addition a 500 nm SEM gun allows nano scale analysis and Scanning Auger analysis, the X-Max Silicon Drift Detector offers fast EDS mapping and an automated analysis is controlled by CASCADE and AZtec software.
The preparation chamber is equipped with a 4-grid SPECTALEED and ISE 5 sputtering source for sample preparation. A separate subsystem allows independent structural analysis of the sample which is performed in the Sample VT SPM using the MATRIX control system.